管式等離子體多晶硅薄膜淀積爐
設備名稱 Equipment Name
管式等離子體多晶硅薄膜淀積爐 Horizontal PECVD (poly-Si)
設備型號 Equipment Model
PD-520
設備用途 Equipment Application
本設備主要用于N-TOPCon電池制備隧穿氧化層、本征poly-si、摻雜poly-si、掩膜層。
This equipment is mainly used for the deposition of tunnel oxide layer, intrinsic poly-si layer, poly-si layer doping and mask layer for TOPCon solar cells.
工藝流程 Process Flow
石墨舟及硅片準備→管內充氮氣→進舟→抽真空、壓力測試→淀積多層復合膜→抽真空、壓力測試→清管路、充氮氣→退舟
Graphite boat & wafers ready→nitrogen inlet→graphite boat load in→vacuumize, pressure test→multi layers deposition→vacuumize, pressure test→Pipe purging, nitrogen inlet→graphite boat unload
技術特點 Features
1、隧穿氧化層、本征poly-Si、摻雜poly-Si、掩膜層，四種工藝薄膜一次原位完成。
Tunnel oxide layer, intrinsic Poly-Si, doping Poly-Si, mask layer, four processes completed in one in-situ doping.
2、具備原位清洗功能。
With in-situ clean.
3、雙水冷密封技術。
Double water-cooled sealing technology.
4、專利內加熱技術。
Patented internal heating technology.
5、高速平穩整體模組推舟機構。
High-speed integral module boat pushing mechanism.
6、懸浮承載舟技術。
Graphite boat contact-free with quartz tube.
7、自主知識產權MES軟件。
MES software with independent intellectual property right.
8、自主開發中央計算機集中控制系統。
Independently developed CCC system.
9、快速鍍膜技術。
Fast coating technology.
10、全面的防超溫、斷偶、撞舟等安全報警保護功能。
Alarm protection for over-heating, thermocouple-break and boat collision.
設備參數 Parameters
